{"id":291348,"date":"2024-10-19T19:46:58","date_gmt":"2024-10-19T19:46:58","guid":{"rendered":"https:\/\/pdfstandards.shop\/product\/uncategorized\/bs-iso-147012018\/"},"modified":"2024-10-25T16:48:50","modified_gmt":"2024-10-25T16:48:50","slug":"bs-iso-147012018","status":"publish","type":"product","link":"https:\/\/pdfstandards.shop\/product\/publishers\/bsi\/bs-iso-147012018\/","title":{"rendered":"BS ISO 14701:2018"},"content":{"rendered":"

This document specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy. It is only applicable to flat, polished samples and for instruments that incorporate an Al or Mg X-ray source, a sample stage that permits defined photoelectron emission angles and a spectrometer with an input lens that can be restricted to less than a 6\u00b0 cone semi-angle. For thermal oxides in the range 1 nm to 8 nm thickness, using the best method described in this document, uncertainties, at a 95 % confidence level, could typically be around 2 % and around 1 % at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties.<\/p>\n

PDF Catalog<\/h4>\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
PDF Pages<\/th>\nPDF Title<\/th>\n<\/tr>\n
2<\/td>\nNational foreword <\/td>\n<\/tr>\n
6<\/td>\nForeword <\/td>\n<\/tr>\n
7<\/td>\nIntroduction <\/td>\n<\/tr>\n
9<\/td>\n1 Scope
2 Normative references
3 Terms and definitions
4 Abbreviated terms and symbols
4.1 Abbreviated terms
4.2 Symbols <\/td>\n<\/tr>\n
10<\/td>\n5 Outline of method <\/td>\n<\/tr>\n
12<\/td>\n6 Method for measuring the oxide thickness
6.1 Cleaning and preparing the sample <\/td>\n<\/tr>\n
13<\/td>\n6.2 Mounting the sample
6.3 Choosing spectrometer settings <\/td>\n<\/tr>\n
16<\/td>\n6.4 Recording data <\/td>\n<\/tr>\n
17<\/td>\n6.5 Measuring intensities <\/td>\n<\/tr>\n
20<\/td>\n6.6 Calculating the oxide thickness <\/td>\n<\/tr>\n
21<\/td>\n6.7 Calculating the uncertainty of the oxide thickness <\/td>\n<\/tr>\n
23<\/td>\nBibliography <\/td>\n<\/tr>\n<\/table>\n","protected":false},"excerpt":{"rendered":"

Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness<\/b><\/p>\n\n\n\n\n
Published By<\/td>\nPublication Date<\/td>\nNumber of Pages<\/td>\n<\/tr>\n
BSI<\/b><\/a><\/td>\n2018<\/td>\n26<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n","protected":false},"featured_media":291352,"template":"","meta":{"rank_math_lock_modified_date":false,"ep_exclude_from_search":false},"product_cat":[1000,2641],"product_tag":[],"class_list":{"0":"post-291348","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-71-040-40","7":"product_cat-bsi","9":"first","10":"instock","11":"sold-individually","12":"shipping-taxable","13":"purchasable","14":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/pdfstandards.shop\/wp-json\/wp\/v2\/product\/291348","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/pdfstandards.shop\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/pdfstandards.shop\/wp-json\/wp\/v2\/types\/product"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/pdfstandards.shop\/wp-json\/wp\/v2\/media\/291352"}],"wp:attachment":[{"href":"https:\/\/pdfstandards.shop\/wp-json\/wp\/v2\/media?parent=291348"}],"wp:term":[{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/pdfstandards.shop\/wp-json\/wp\/v2\/product_cat?post=291348"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/pdfstandards.shop\/wp-json\/wp\/v2\/product_tag?post=291348"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}