IEC 62047-29:2017
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Semiconductor devices – Micro-electromechanical devices – Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature
Published By | Publication Date | Number of Pages |
IEC | 2017-11-22 | 16 |
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IEC 62047-29:2017(E) specifies a relaxation test method for measuring electromechanical properties of freestanding conductive thin films for micro-electromechanical systems (MEMS) under controlled strain and room temperature. Freestanding thin films of conductive materials are extensively utilized in MEMS, opto-electronics, and flexible/wearable electronics products. Freestanding thin films in the products experience external and internal stresses which could be relaxed even under room temperature during a period of operation, and this relaxation leads to time-dependent variation of electrical performances of the products. This test method is valid for isotropic, homogeneous, and linearly viscoelastic materials.
Published Code | IEC |
---|---|
Published By | International Electrotechnical Commission |
Publication Date | 2017-11-22 |
Pages Count | 16 |
Language | English |
Edition | 1.0 |
File Size | 1.6 MB |
ICS Codes | 31.080.99 - Other semiconductor devices |
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